Detail Information
Category
Article
Author
Ishikawa, K.:Y, Uchiyama:H, Ogawa:S. Fujimura
Article Title
Dependence of TO TO and LO mode frequency of thermally grown silicon dioxide films on annealing temperature
Institution
Applied surface science
Volume
vol.117/118
Number
Page
212
Date
1997
Abstract
Notes
URL
Label
技術経営
Register date
1997/12/31